Atmospheric Pressure Deposition of Fluorinedoped SnO2 Thin Films from Organotin Fluorocarboxylate Precursors.
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Date
2005Author
Mahon, Mary F
Molloy, Kieran C
Stanley, Joanne E
Rankin, David W H
Robertson, Heather E
Johnston, Blair F
Metadata
Abstract
Nine organotin fluorocarboxylates RnSnO2CRf (n = 3, R = Bu, Rf = CF3, C2F5, C3F7, C7F15; R = Et,
Rf = CF3, C2F5; R = Me, Rf = C2F5; n = 2, R =Me, Rf = CF3) have been synthesised; key examples
have been used to deposit F-doped SnO2 thin films by atmospheric pressure CVD.
Et3SnO2CC2F5, in particular, gives high quality films with fast deposition rates despite adopting
a polymeric, carboxylate-bridged structure in the solid state, as determined by x-ray
crystallography. Gas phase electron diffraction on the model compound Me3SnO2CC2F5 shows
that accessible conformations do not allow contact between tin and fluorine, and that direct
transfer is therefore unlikely to be part of the mechanism for fluorine incorporation in SnO2
films. The structure of Me2Sn(O2CCF3)2(H2O) has also been determined and adopts a trans-
Me2SnO3 coordination sphere about tin in which each carboxylate group is monodentate