Electrical resistivity measurements of lattice defects in hexagonal close packed metals
dc.contributor.author
Will, Leonard D.
en
dc.date.accessioned
2015-11-04T16:10:25Z
dc.date.available
2015-11-04T16:10:25Z
dc.date.issued
1973
dc.description.abstract
Lattice defects produced in zinc and cadmium by plastic
deformation at 78 K have been investigated by means of electrical
resistivity measurements at 78 K. Single crystals and polycrystalline
samples of both metals have been used. The annealable increase in the
resistivity of single crystals with deformation is generally less than
0.5% for deformations of up to 5% in zinc and 10% in cadmium. This
is too small for annealing stages to be resolved satisfactorily,
particularly since they are obscured by irregular changes in resistance
during annealing, attributed to anisotropic thermal expansion of
neighbouring sub-grains. Polycrystalline zinc is too brittle to allow significant
deformation at low temperature, but a measurable resistivity increase
has been produced in polycrystalline cadmium. The increase is
proportional to strain, with a coefficient (12.5 ± 0.7) nQm per unit
strain, half due to dislocations and half to point defects. This value
is consistent with the point defect production mechanism being nonconservative
movement of dislocation jogs, producing a defect
concentration of 0.1% per unit strain, the resistivity of defects being
60 nΩm per 1% atomic concentration. Isochronal and sequential isothermal annealing was performed,
and the activation energy was determined by an improved version of
the change-of-slope method which eliminates the necessity for subjective
curve-fitting operations. The annealing spectrum was divided into
three stages: stage III, at 80 to 130 K, activation energy 0.16 ± 0.03 eV;
stage IV, at 130 to 180 K, activation energy increasing from 0.2 eV to
-0.4 eV; and stage V, 180 to 220 K, 0.7 ± 0.1 eV. There was no unique order of kinetics at any stage, and it appears that a number of
overlapping processes took place. Stage III is attributed to the
annealing of interstitials and stage IV to vacancies, but both these
defects probably moved in groups of two or more and interacted with
impurities. Stage V is attributed to dislocation rearrangement.
en
dc.identifier.uri
http://hdl.handle.net/1842/11577
dc.publisher
The University of Edinburgh
en
dc.relation.ispartof
KB thesis scanning project 2015
en
dc.title
Electrical resistivity measurements of lattice defects in hexagonal close packed metals
en
dc.type
Thesis or Dissertation
en
dc.type.qualificationlevel
Doctoral
en
dc.type.qualificationname
PhD Doctor of Philosophy
en
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